@phdthesis{yang:tel-02441549,
TITLE = {Fabrication and characterization of silicon nanowires for device applications compatible with low temperature ($\le$300 ˚C) flexible substrates},
AUTHOR = {Yang, Kai},
URL = {https://hal.science/tel-02441549},
SCHOOL = {Universit{\'e} de Rennes 1},
YEAR = {2019},
MONTH = Dec, KEYWORDS = {Sillicon nanowires ; low temperature ; spacer method ; SLS process ; ICP-CVD ; ICP-CVD ; m{\'e}thode des espaceurs ; proc{\'e}d{\'e} SLS ; basse temp{\'e}rature ; Nanofils de silicium},
TYPE = {Theses},
PDF = {https://hal.science/tel-02441549/file/%5BVer.%206.1%5DPhD%20thesis.pdf},
HAL_ID = {tel-02441549},
HAL_VERSION = {v1},
}