@article{zgheib:hal-04299303,
TITLE = {Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge},
AUTHOR = {Zgheib, J. and Berthelot, L. and Tranchant, J. and Ginot, N. and Besland, M.-P. and Caillard, A. and Minea, T. and Rhallabi, A. and Jouan, P.-Y.},
URL = {https://hal.science/hal-04299303},
JOURNAL = {Journal of Vacuum Science \& Technology A},
PUBLISHER = {American Vacuum Society},
VOLUME = {41},
NUMBER = {6},
PAGES = {063003},
YEAR = {2023},
DOI = {10.1116/6.0002857},
KEYWORDS = {THIN-FILMS ; LANGMUIR PROBE ; DEPOSITION ; HIPIMS ; MODEL ; TIME ; MICROSTRUCTURE ; SPECTROSCOPY ; BOMBARDMENT ; PRESSURE},
PDF = {https://hal.science/hal-04299303/file/e-Hipims_manuscript_JVST_JZ_final.pdf},
HAL_ID = {hal-04299303},
HAL_VERSION = {v1},
}