@article{yang:hal-03776598,
TITLE = {Inductively Coupled Plasma Chemical Vapor Deposition for Silicon-Based Technology Compatible with Low-Temperature ($\le$220\,{\textdegree}C) Flexible Substrates},
AUTHOR = {Yang, Kai and de Sagazan, Olivier and Pichon, Laurent and Sala{\"u}n, Anne-Claire and Coulon, Nathalie},
URL = {https://hal.science/hal-03776598},
JOURNAL = {physica status solidi (a)},
PUBLISHER = {Wiley},
VOLUME = {217},
NUMBER = {5},
PAGES = {1900556},
YEAR = {2020},
MONTH = Jan, DOI = {10.1002/pssa.201900556},
HAL_ID = {hal-03776598},
HAL_VERSION = {v1},
}