@article{talaighil:hal-03662132,
TITLE = {State creation induced by gate bias stress in unhydrogenated polysilicon TFTs},
AUTHOR = {Tala-Ighil, B. and Rahal, A. and Mourgues, K. and Toutah, A. and Pichon, L. and Mohammed-Brahim, T. and Raoult, F. and Bonnaud, O.},
URL = {https://hal.science/hal-03662132},
JOURNAL = {Thin Solid Films},
PUBLISHER = {Elsevier},
VOLUME = {337},
NUMBER = {1-2},
PAGES = {101-104},
YEAR = {1999},
MONTH = Jan, DOI = {10.1016/S0040-6090(98)01192-4},
HAL_ID = {hal-03662132},
HAL_VERSION = {v1},
}