@article{landesman:hal-03043725,
TITLE = {Mechanical stress in InP and GaAs ridges formed by reactive ion etching},
AUTHOR = {Landesman, Jean-Pierre and Fouchier, Marc and Pargon, Erwine and G{\'e}rard, Sol{\`e}ne and Rochat, N{\'e}vine and Levallois, Christophe and Mokhtari, Merwan and Pagnod-Rossiaux, Philippe and Laruelle, Fran{\c c}ois and Petit-Etienne, Camille and Bettiati, Mauro and Jimenez, Juan and Cassidy, Daniel T},
URL = {https://hal.science/hal-03043725},
JOURNAL = {Journal of Applied Physics},
PUBLISHER = {American Institute of Physics},
VOLUME = {128},
NUMBER = {22},
YEAR = {2020},
MONTH = Dec, DOI = {10.1063/5.0032838},
PDF = {https://hal.science/hal-03043725/file/Landesman_et_al_JAP_v02.pdf},
HAL_ID = {hal-03043725},
HAL_VERSION = {v1},
}