@article{gutierrez:hal-02917609,
TITLE = {Analysis by HR-STEM of the Strain Generation in InP after SiNx Deposition and ICP Etching},
AUTHOR = {Guti{\'e}rrez, M. and Reyes, Df and Araujo, D. and Landesman, Jean-Pierre and Pargon, E.},
URL = {https://hal.univ-grenoble-alpes.fr/hal-02917609},
JOURNAL = {Journal of Electronic Materials},
PUBLISHER = {Institute of Electrical and Electronics Engineers},
VOLUME = {49},
NUMBER = {9},
PAGES = {5226-5231},
YEAR = {2020},
MONTH = Sep, DOI = {10.1007/s11664-020-08312-6},
KEYWORDS = {InP etch ; HR-STEM images ; quantitative strain analysis ; SiN x patterns ; e-beam lithography},
PDF = {https://hal.univ-grenoble-alpes.fr/hal-02917609/file/gutierrez-auteur.pdf},
HAL_ID = {hal-02917609},
HAL_VERSION = {v1},
}