@inproceedings{landesman:hal-02324800,
TITLE = {Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl2/CH4 Plasma Chemistry},
AUTHOR = {Landesman, Jean-Pierre and Cassidy, Daniel T. and Fouchier, Marc and Pargon, Erwine and Levallois, Christophe and Mokhtari, Merwan and Youssef, Laur{\`e}ne and Jim{\'e}nez, Juan and Torres, Alfredo},
URL = {https://hal.univ-grenoble-alpes.fr/hal-02324800},
BOOK
TITLE = {11th International Workshop on Plasma Etch and Strip in Microelectronics (PESM 2019)},
ADDRESS = {Grenoble, France},
YEAR = {2019},
MONTH = May, HAL_ID = {hal-02324800},
HAL_VERSION = {v1},
}