@inproceedings{landesman:hal-02291455,
TITLE = {Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl2/CH4 Plasma Chemistry},
AUTHOR = {Landesman, Jean-Pierre and Fouchier, Marc and Pargon, Erwine and Rochat, N{\'e}vine and Cassidy, Daniel T and Levallois, Christophe and Mokhtari, Merwan and Youssef, Laur{\`e}ne and Jim{\'e}nez, Juan and Torres, Alfredo},
URL = {https://hal.science/hal-02291455},
BOOK
TITLE = {11th Plasma Etch and Strip in Microtechnology workshop (PESM 2019)},
ADDRESS = {Grenoble, France},
YEAR = {2019},
MONTH = May, HAL_ID = {hal-02291455},
HAL_VERSION = {v1},
}