@article{landesman:hal-01861357,
TITLE = {Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl-2/CH4 Plasma Chemistry},
AUTHOR = {Landesman, Jean-Pierre and Cassidy, Daniel T and Fouchier, Marc and Pargon, Erwine and Levallois, Christophe and Mokhtari, Merwan and Jim{\'e}nez, Juan and Torres, Alfredo},
URL = {https://univ-rennes.hal.science/hal-01861357},
JOURNAL = {Journal of Electronic Materials},
PUBLISHER = {Institute of Electrical and Electronics Engineers},
SERIES = {Special Section: 17th Conference on Defects-Recognition, Imaging and Physics in Semiconductors (DRIP XVII)},
VOLUME = {47},
NUMBER = {9},
PAGES = {4964-4969},
YEAR = {2018},
MONTH = Sep, DOI = {10.1007/s11664-018-6152-6},
KEYWORDS = {Indium phosphide ; photonic devices ; plasma etching ; mechanical stress},
PDF = {https://univ-rennes.hal.science/hal-01861357/file/Landesman_Mechanical%20Stress%20in%20InP%20Structures_Accept%C3%A9e.pdf},
HAL_ID = {hal-01861357},
HAL_VERSION = {v1},
}