@article{choudhary:hal-01809058,
TITLE = {Oxidation mechanism of thin Cu films A gateway towards the formation of single oxide phase},
AUTHOR = {Choudhary, Sumita and Sarma, J.V.N. V N and Pande, Surojit and Ababou-Girard, S. and Turban, Pascal and L{\'e}pine, B. and Gangopadhyay, Subhashis},
URL = {https://univ-rennes.hal.science/hal-01809058},
JOURNAL = {AIP Advances},
PUBLISHER = {American Institute of Physics- AIP Publishing LLC},
VOLUME = {8},
NUMBER = {5},
PAGES = {055114},
YEAR = {2018},
MONTH = May, DOI = {10.1063/1.5028407},
KEYWORDS = {Copper oxides ; Oxygen ; Partial pressure ; Photoelectron spectroscopy ; Scanning electron microscopy ; Temperature ; Thermal evaporation ; Thermooxidation ; Vacuum evaporation ; Crystallographic orientations ; Oxidation mechanisms ; Oxidation temperature ; Oxygen partial pressure ; Silicon substrates ; Thermal evaporation technique ; Thermodynamic equilibria ; X ray photoemission spectroscopy ; Oxide films ; Metallic films},
PDF = {https://univ-rennes.hal.science/hal-01809058/file/1.5028407-1.pdf},
HAL_ID = {hal-01809058},
HAL_VERSION = {v1},
}