@misc{landesman:hal-01710320,
TITLE = {Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Chlorine Chemistry},
AUTHOR = {Landesman, Jean-Pierre and Cassidy, Daniel T and Pargon, Erwine and Levallois, Christophe and Mokhtari, Merwan and Jim{\'e}nez, Juan and Torres, Alfredo},
URL = {https://hal.science/hal-01710320},
NOTE = {Poster},
HOWPUBLISHED = {18th Canadian Semiconductor Science and Technology Conference (CSSTC 2017)},
YEAR = {2017},
MONTH = Aug, HAL_ID = {hal-01710320},
HAL_VERSION = {v1},
}