@article{toutah:hal-01647833,
TITLE = {State creation under gate-bias stress in polysilicon TFTs studied from the temperature-transfer characteristics behavior},
AUTHOR = {Toutah, H. and Llibre, Jean-Fran{\c c}ois and Tala-Ighil, B. and Boudart, B. and Mohammed-Brahim, T.},
URL = {https://hal.science/hal-01647833},
JOURNAL = {Thin Solid Films},
PUBLISHER = {Elsevier},
VOLUME = {427},
NUMBER = {1-2},
PAGES = {340 - 344},
YEAR = {2003},
MONTH = Mar, DOI = {10.1016/S0040-6090(02)01209-9},
HAL_ID = {hal-01647833},
HAL_VERSION = {v1},
}