@article{li:hal-01395443,
TITLE = {Effect of growth interruptions on TiO2 films deposited by plasma enhanced chemical vapour deposition},
AUTHOR = {Li, D. and Goullet, A. and Carette, Mich{\`e}le and Granier, A. and Landesman, Jean-Pierre},
URL = {https://univ-rennes.hal.science/hal-01395443},
JOURNAL = {Materials Chemistry and Physics},
PUBLISHER = {Elsevier},
VOLUME = {182},
PAGES = {409-417},
YEAR = {2016},
DOI = {10.1016/j.matchemphys.2016.07.049},
KEYWORDS = {thin-films ; optical-properties ; spectroscopic ellipsometry ; ion-bombardment ; low-pressure ; temperature ; rutile ; coatings ; anatase ; reactor},
HAL_ID = {hal-01395443},
HAL_VERSION = {v1},
}