@inproceedings{viana:hal-00958880,
TITLE = {Polycrystalline CMOS TFT's Low Temperature (<600 B{\textdegree}) Fabrication Process by LPCVD and SPC Techniques},
AUTHOR = {Viana, C.E. and Gautier, G. and Crand, Samuel and Morimoto, N.I. and Bonnaud, Olivier},
URL = {https://hal.science/hal-00958880},
BOOK
TITLE = {Proc. IDMC 922002},
ADDRESS = {Seoul, South Korea},
PAGES = {421-423},
YEAR = {2002},
MONTH = Jan, HAL_ID = {hal-00958880},
HAL_VERSION = {v1},
}