@article{girard:hal-00860238,
TITLE = {SiGe derivatization by spontaneous reduction of aryl diazonium salts},
AUTHOR = {Girard, Aur{\'e}lie and Geneste, Florence and Coulon, Nathalie . and Cardinaud, Christophe and Mohammed-Brahim, Tayeb},
URL = {https://univ-rennes.hal.science/hal-00860238},
JOURNAL = {Applied Surface Science},
PUBLISHER = {Elsevier},
VOLUME = {282},
PAGES = {146-155},
YEAR = {2013},
DOI = {10.1016/j.apsusc.2013.05.091},
KEYWORDS = {Germanium ; Diazonium salts ; Derivatization ; Film thickness ; Plasma etching ; Semiconductors},
PDF = {https://univ-rennes.hal.science/hal-00860238/file/SiGe-derivatization-postprint-accepted.pdf},
HAL_ID = {hal-00860238},
HAL_VERSION = {v1},
}