@article{lu:hal-00786428,
TITLE = {Influence of the sputtering reactive gas on the oxide and oxynitride LaTiON deposition by RF magnetron sputtering},
AUTHOR = {Lu, Yu and Le Paven-Thivet, Claire and Benzerga, Ratiba and Le Gendre, Laurent and Sharaiha, Ala and Tessier, Franck and Chevir{\'e},
Fran{\c c}ois},
URL = {https://hal.science/hal-00786428},
JOURNAL = {Applied Surface Science},
PUBLISHER = {Elsevier},
VOLUME = {264},
PAGES = {533-537},
YEAR = {2013},
DOI = {10.1016/j.apsusc.2012.10.059},
KEYWORDS = {Oxynitride Thin films RF sputtering Epitaxy Reactive gas},
HAL_ID = {hal-00786428},
HAL_VERSION = {v1},
}