@inproceedings{kandoussi:hal-00437491,
TITLE = {160cm2/Vs microcrystalline silicon TFTs mobility thanks to nex deposition process of both Undoped and doped films performed at T<200{\textdegree} C},
AUTHOR = {Kandoussi, Khalid and Simon, Claude and Coulon, Nathalie . and Mohammed-Brahim, Tayeb},
URL = {https://hal.science/hal-00437491},
BOOK
TITLE = {AM-FPD 2006},
ADDRESS = {Tokyo, Japan},
YEAR = {2006},
MONTH = Jul, HAL_ID = {hal-00437491},
HAL_VERSION = {v1},
}